The following source type options can be specified in the Source Card:
Under the Nonaqueous Fluid Mass Rate source type, NAPL is injected/withdrawn into/from the node(s) at the specified mass rate during indicated time period. This source requires additional inputs of temperature, CO2 mole fraction of NAPL components, CH4 Mole Fraction of NAPL components, and water-vapor relative saturation.
The rates specified in a Source card are for a single node. Therefore, if a source is applied over several nodes, the total aqueous mass rate of injection/withdrawal should be divided between these nodes.